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Combining laser writer (micro) + e-beam lithography (nano)

laser direct writer image mask pattern on photoresist
laser direct writer electrode image mask pattern on photoresist
laser direct writer image mask pattern on photoresist
laser direct writer electrode image mask pattern on photoresist
laser direct writer electrode image mask pattern on photoresist
laser direct writer electrode image mask pattern on photoresist full size
laser direct writer electrode image mask pattern on photoresist
laser direct writer electrode image mask pattern on photoresist
laser direct writer electrode image mask pattern on photoresist for EBL
laser direct writer electrode image mask pattern on photoresist for EBL1
laser direct writer electrode image mask pattern on photoresist for EBL2
laser direct writer electrode image mask pattern on photoresist for EBL3
laser direct writer electrode image mask pattern
laser direct writer electrode lift-off pattern on photoresist for EBL

CAD designed PR Patterning in Circular mode

laser direct writer CAD mask pattern on photoresist
laser direct writer CAD mask pattern on photoresist zoom in
laser direct writer CAD mask pattern on photoresist zoom in with marker

Double layer PR Patterning for lift-off process

Array pattern with vector writing

Patterning on MoS2 flake and Lift-off Process

Metal Electrode (Ti/Au) Pattern by Lift-off 

Line patterns for narrow width optimization

Raster Scanning for Large Area Filling

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sales@sejongsciinst.com

010-4892-3458

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