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Combining laser writer (micro) + e-beam lithography (nano)

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CAD designed PR Patterning in Circular mode

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Double layer PR Patterning for lift-off process

Array pattern with vector writing

Patterning on MoS2 flake and Lift-off Process

Metal Electrode (Ti/Au) Pattern by Lift-off 

Line patterns for narrow width optimization

Raster Scanning for Large Area Filling

Sejong Scientific Instruments Inc.

​Customized research equipment specialist company

sales@sejongsciinst.com

010-4892-3458

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