Micro patterning for device fabrication

Laser writer (micro pattern) + e-beam lithography (nano pattern)

Maskless Photolithography drawing micro patterns

Circular mode: CAD pattern (4 layers w/ different doses)

Raster mode: image file (BW Image pixels: 1000 x 1000)

Vector mode: line drawing by mousing drawing

 Light source: UV laser (405 nm) beam

Objective lens: 5x, 10x, 20x, 50x, 100x

hardware: XYZ motorized micro-stage and optical microscope

writing software: compatitble for CAD file (dxf), and  BW image file and Mouse drawing line patterns paths

vector line drawing: The user draws lines directly with the mouse while looking at the microscope image of sample, and the scanner draws a pattern along these lines.

maximum writing speed: 600 um/sec

minimum spot size: 1 um

2 writing modes: area filling with low resolution + line drawing with high resolution

Photoresist: compatible for general optical lithography PR

Applications: solar cell electrodes, big electrodes in micro-device, contact pad for device, microfluidics device

XY stage with ​substrate tilt correction

Optionally Combined with Scanning Photocurrent Microscope 

Price: ~$23,000 (+3,000 SPCM combined)